No matter how careful chip design engineers are, and regardless of what implementation tools they use, a verification team will always encounter design rule checking (DRC) errors during the signoff ...
Self-aligned double patterning (SADP) is an alternative double-patterning process to the traditional litho-etch-litho-etch (LELE) approach used in most advanced production nodes. The main difference ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback