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Wet etch processes risk delaminating them. Plasma etching risks surface damage, and the protective etch “polymer” that typically protects surfaces in silicon CMOS processes is difficult to remove.

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Developed in collaboration with the Max Planck Institute for Plasma Physics specifically for the Wendelstein 7-X stellarator 1, Thales’s TH1507U gyrotron has achieved a significant milestone by ...

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A persistent mystery, however, has been the structure and makeup of black hole coronas — dynamic plasma regions that are part of the flow of matter into the black holes themselves. Similar to ...

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Poston, and a team of researchers outline how post-impact conditions, such as from a meteoroid impact, could produce liquid brines that temporarily flow along the surface long enough to etch ...