Measuring and exposing a wafer - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
Measuring and exposing a wafer - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
1 month ago
makeagif.com
The full EUV optical light path - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
The full EUV optical light path - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
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makeagif.com
The reticle and reticle stage - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
The reticle and reticle stage - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
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makeagif.com
ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
Dec 5, 2018
ieee.org
全球最顶尖的光刻机生产公司ASML NXE:3400B 一台就是12亿元堪称史上最贵半导体设备了
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全球最顶尖的光刻机生产公司ASML NXE:3400B 一台就是12亿元堪称史上最贵半导体设备了
16.7K viewsDec 25, 2019
bilibili我的id很简单
ASML engineers and technicians work in a high-tech environment where cleanroom processes, module builds, and hands-on training come together to produce the world’s most advanced lithography systems used in semiconductor production. | ASML
1:23
ASML engineers and technicians work in a high-tech environment where cleanroom processes, module builds, and hands-on training come together to produce the world’s most advanced lithography systems used in semiconductor production. | ASML
1.8K views9 months ago
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【ASML 2019第二季財報重點】 #產品重點摘要 ✅ 極紫外光 (EUV) 微影系統：ASML持續強化NXE:3400C的量產效能，不僅在ASML廠內展示每小時曝光超過170片晶圓的實力，在客戶端實際生產記憶體晶片的製造條件下，也成功達到每天曝光超過2,000片晶圓的成果。 ✅ ASML已同意將EUV光罩護膜 (pellicle) 組裝技術授權給日商三井化學公司 (Mitsui Chemicals)。未來，三井化學將能夠為我們的客戶提供大批量的組裝和光罩護膜銷售。同時，ASML將繼續與其合作夥伴共同開發下一代光罩護膜，持續改善EUV光罩護膜的效能。 #展望 展望2019年第三季度，ASML預估銷售淨額可達30億歐元，毛利率約43~44%。研發費用約4.95億歐元，管理支出費用 (SG&A) 約1.25億歐元。ASML預估2019年的年化有效稅率約為9%。 #ASML #QuarterlyResults | ASML
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【ASML 2019第二季財報重點】 #產品重點摘要 ✅ 極紫外光 (EUV) 微影系統：ASML持續強化NXE:3400C的量產效能，不僅在ASML廠內展示每小時曝光超過170片晶圓的實力，在客戶端實際生產記憶體晶片的製造條件下，也成功達到每天曝光超過2,000片晶圓的成果。 ✅ ASML已同意將EUV光罩護膜 (pellicle) 組裝技術授權給日商三井化學公司 (Mitsui Chemicals)。未來，三井化學將能夠為我們的客戶提供大批量的組裝和光罩護膜銷售。同時，ASML將繼續與其合作夥伴共同開發下一代光罩護膜，持續改善EUV光罩護膜的效能。 #展望 展望2019年第三季度，ASML預估銷售淨額可達30億歐元，毛利率約43~44%。研發費用約4.95億歐元，管理支出費用 (SG&A) 約1.25億歐元。ASML預估2019年的年化有效稅率約為9%。 #ASML #QuarterlyResults | ASML
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How ASML Builds a $150 Million EUV Machine
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完整的EUV光路-TWINSCAN NXE 3400 EUV光刻机ASML内
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【揭密 ASML High-NA EUV 微影設備】 邁向先進晶片製造的未來，ASML推出 High-NA EUV 微影設備：TWINSCAN EXE。 ASML 致力於與產業生態圈夥伴們共同推動技術進步，我們持續突破微影技術，讓晶片的效率、功能和能源效率更上一層樓，憑藉先進的變形光學系統和大幅加速的平台模組，TWINSCAN EXE 平台支援 8 奈米解析度。與 NXE 相比，成像對比度提高了 40%，同時也提高產量，降低了成本和瑕疵。 EXE 為電晶體密度和晶片性能樹立了新的基準，滿足未來多個邏輯和記憶體節點的需求。 ​ 深入探索ASML：https://www.asml.com/zh-tw | ASML
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【ASML 週報 | 快，還能更快！我們持續突破速度極限⚡】 覺得你的網速夠快了？試試這個對比——當你還在等一部電影下載🎬，ASML 的 High NA EUV 已經在晶圓上精準投影出數十億個電晶體！在半導體製造的世界裡，「速度」與「精準度」並重，而 ASML 的微影技術正不停地刷新極限，持續推動技術創新邁向新高度。 #從曝光速度到技術突破 其實在 2006 年，ASML 的第一台 EUV 設備 Alpha Demo Tool 問世時，需要 23 小時才能完成 1 片晶圓的曝光。現在，ASML 最新的 EUV 設備 TWINSCAN NXE 系列，每小時可完成 185 片晶圓曝光，相當於 19 秒就能完成一片晶圓的曝光。在 20 年不到的時間裡，我們將速度提升近 4,255 倍，堪稱半導體世界的光速革命！ 這一切的關鍵來自 ASML 在光學、機械、材料與精密製造的極致追求。我們的微影設備僅需 0.1 秒，就能完成晶圓上一個單元的曝光。高能雷射光穿透光罩，經由精密光學系統將影像縮小 1/16，再投影至晶圓的光阻劑塗層上，把半導體產業製程解析度由微米帶向奈米維度。 當你以為「快」已經來到
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